The quasi-simultaneous deposition of low energy-mass-selected C+ and either Au+ or Fe+ ions resulted in the formation of alternately metal-rich and metal-deficient layers in an amorphous carbon matrix with periods in the nm range. The metal-rich layers consist of densely distributed crystalline particles while the metal-deficient layers are amorphous or contain only smaller numbers of crystalline clusters. A similar structure was found in films grown by reactive dc-magnetron sputtering of Cu, Pt, and Ni targets in an Ar/CH4 plasma. The multilayer formation can be described by an interplay of sputtering, surface segregation, ion induced diffusion, and the stability of small clusters against ion bombardment. |
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