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1 Sony Corporation Frontier Science Laboratories,
2-1-1, Shinsakuragaoka, Hodogaya-ku,
Yokohama 240-0036, Japan
2 Bundesanstalt für Materialforschung und -prüfung,
Unter den Eichen 44-46 D-12203 Berlin, Germany
| We studied the polymerization of C60 under different Ar plasma conditions. Films were either deposited in the pressure range between 1.3 and 40 Pa applying input power of 50 W or evaporated C60 films were exposed to Ar plasma of 30 and 50 W. The films were investigated by Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and carbon K near-edge X-ray-absorption fine structure spectroscopy (NEXAFS). The films were non-uniform and consisted of unpolymerized C60, dimers, linear chains and polymeric planes. In comparison with evaporated C60 the XPS C 1s peak is broader and asymmetric for the C60 polymer and its shake-up satellites diminished. Furthermore, the features of the valence band as well as the features of the π* antibonding orbitals of the C60 polymer are broader and reduced in intensity. |
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