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1 Kagami Memorial Laboratory for Materials Science and Technology,
Waseda University,
2-8-26 Nishiwaseda, Shinjuku-ku, Tokyo 169-0051, Japan
2 Department of Applied Chemistry, School of Science and Engineering,
Waseda
University,
3-4-1 Okubo, Shinjuku-ku, Tokyo 169-8555, Japan
| A novel process of electron-beam nanometer-scale fabrication on Si(111) wafer surfaces has been proposed on the basis of application of alkyl monolayers as the patterning media. The alkyl (CnH2n+1-) monolayers prepared with the Grignard reagents were subjected to electron-beam patterning with ambient O2 and deposition of metals onto the formed patterns by immersion into aqueous solutions containing metal ions. The tolerance of alkyl-covered Si(111) surface towards aqueous solutions has been demonstrated. The alkyl monolayer survived in Cu deposition solution containing HF, even while a visible amount of Cu deposit was built up. |
full paper (pdf, 82 Kb)