No 1, Vol. 5, 2002 
 

NANOSTRUCTURED VACUUM ARC DEPOSITED TITANIUM COATINGS

B.B. Straumal1, N.F. Vershinin1,2, A.A. Asrian 1, E. Rabkin 3 and R. Kroeger 4

1 Institute of Solid State Physics, Chernogolovka, Moscow District, RU-142432, Russia
2 SONG Ltd., P.O. Box 98, Chernogolovka, Moscow District, RU-142432, Russia
3 Dpt Materials Engineering, TECHNION-Israel Institute of Technology, IL-32000 Haifa, Israel
4 Institute for Solid State Physics, University of Bremen, Kufsteiner Str., DE-28359 Bremen, Germany

Abstract

Ti coatings on silicate glass substrates have been produced using a nonfiltered vacuum arc deposition technique. The dependence of the deposition rate on the distance from the cathode both in lateral and transversal directions was investigated. The average roughness, Ra , decreases with the distance, showing a transition area between the microparticle-containing and microparticle-free Ti films. A linear dependence of Ra depends strongly on the number of microparticles. A linear dependence of Ra on the discharge current was obtained only for substrates far enough from the cathode. For substrates close to the cathode the dependence is governed by the microparticle density. Transmission electron microscopy (TEM) reveals dense structure with nanograins.

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