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Department of Applied Physics, Chongqing University,
Chongqing 400044, P. R. China
During the process of nano-lithography on solid material surfaces by a
Scanning Tunneling Microscope (STM) system working at constant current mode,
while a high-voltage electric pulse acts on the gap between the tip and the
sample surface, the feedback circuit causes the tip to withdraw swiftly,
resulting in a reduction of effective pulse-width. In the experiment
presented in this paper, a specially designed and computer controlled
temporary "holding" function can maintain the tip position and the
tip-sample distance during the whole period when the high-voltage pulse
acts, so that the effective pulse-width can be accurately measured. An
experiment of lithography on a graphite surface in air found, for the first
time, the threshold of effective pulse-width to be (0.04±0.01)µS, with a
voltage amplitude of 4V.
Keywords: nano-lithography, scanning tunneling microscope, graphite surface |
full paper (pdf, 128 Kb)