Epitaxial La0.85Na0.15Mn1-xNixO3 (0˜x˜0.2) thin films are fabricated successfully on LaAlO3 (LAO) (100) substrates using chemical solution deposition method. The results reveal that with the increase of the Ni-doping content, the x-ray diffraction intensity ratio of I(111)/I(200) increases, whereas both the grain size and the roughness decrease. The magnetic and transport measurements show that it is effective to tune the MR effects via Ni doping at Mn-sites. |
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