| Diamond-like carbon deposition techniques, characterization techniques and processing parameters, such as gas ratio, bias voltage, gas pressure, type of precursor gas used, temperature, gas total flow, substrate material, among others are reviewed. Mostly silicon substrates have been employed, but also metallic materials such as titanium and aluminum alloys or steels have been used as well. Improvements of films properties, specially the adhesion, were carried out through doping of the film, during or after deposition. |
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