1 STR GmbH, P.O. Box 1207, D-91002 Erlangen, Germany
2 Soft-Impact, Ltd. P.O. Box 33, Engelsa pr. 27, 194156 St. Petersburg, Russia
3 Centre of Isotopic Research, Karpinsky All-Russian Geological Institute, Sredny pr. 74,
199106, St. Petersburg, Russia
4 AIXTRON AG, Kackertstr. 15-17, D-52072 Aachen, Germany
Thermal stability of a new promising precursor for HfO2 MOCVD, Hf(OBut)2mmp2, was studied by mass spectrometry in a temperature range from 25 to 450 °C at pressure varying from 0.5 to 5 Torr. The onset of gaseous Hf(OBut)2mmp2 thermal decomposition was found to occur at a temperature of about 300 °C. The Arrhenius function k(T) = k0exp(-Ea/RT) was used to describe the temperature effect on the precursor decomposition at 300-350 °C; the values of the activation energy Ea = 92.14 kJ/mol and k0 = 1.25 106 1/s are recommended for this temperature range. Possible decomposition mechanisms are discussed. |
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