No 4, Vol. 5, 2004 
 

EFFECTS OF ENERGETIC SPECIES DURING THE GROWTH OF BORON NITRIDE AND AMORPHOUS CARBON THIN FILMS BY SPUTTER DEPOSITION

S. Logothetidis

Aristotle University of Thessaloniki, Department of Physics, Solid State Physics Section,
GR-54124 Thessaloniki, Greece

Abstract

We study the effect of Ar+ irradiation during the growth of BN and a-C by sputter deposition. We found that the dominant effects for the BN growth are the subplantation of N+ and B+ species. For energies higher than the threshold for Ar+ subplantation, the Ar+ penetrate into BN and disrupts the B-N bonds resulting to defective BN. The existence of Ar impurities in such films promotes the stability of C impurities. These effects result to a very narrow window of ion energy (<40 eV) were successful growth of BN films may be achieved. On the other hand, in a-C films sp3-bonded C we found a close correlation between the Ar impurities with the sp3 C-C bonds, which suggest that Ar impurities promote the formation of sp3-bonded carbon in a-C, in contrast to BN growth. In addition, it was found that the films grown using C+ (Ar+) exhibit a sp2 (sp3) surface, while the deeper monolayers are sp3 (mixed sp3-sp2) bonded. We found two mechanisms of sp3 formation: on the surface and in the bulk of a-C. We conclude that at medium energy (>100 eV) the surface effects are negligible (for both C+ and Ar+), while the surface processes dominate when low-energy (~40 eV) Ar+ ions are used.

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