ipmash@ipme.ru | +7 (812) 321-47-78
пн-пт 10.00-17.00
Институт Проблем Машиноведения РАН ( ИПМаш РАН ) Институт Проблем Машиноведения РАН ( ИПМаш РАН )

Institute for Problems in Mechanical Engineering
of the Russian Academy of Sciences

Institute for Problems in Mechanical Engineering of the Russian Academy of Sciences

Installations:

1. Ultraviolet variable angle spectroscopic ellipsometer J.A. Woollam VUV-VASE

Optical characterization of thin films in the range from ultraviolet (146 nm) to near infrared (1100 nm). This provides incredible versatility to characterize numerous materials: semiconductors, dielectrics, polymers, metals, multi-layers and liquids such as immersion fluids. Ellipsometer allows to measure optical constants and thickness of thin films and determine their crystal polytypes.

2. Adsorption nitrogen generator proVITA

It produces nitrogen of high-purity (99.99%) for the work of the ultraviolet ellipsometer.

3. Confocal Raman imaging microscope Witec Alpha 300R

It is one of the best instruments of this kind and has characteristics that are limited only by the fundamental laws of nature. A movable 3D piezo-table allows us to obtain Raman spectra and build 2D and 3D maps based on them with a lateral resolution of up to 250 nm and a vertical resolution of up to 900 nm. The technique is non-destructive and makes it possible to determine the local composition, mechanical stresses, as well as the crystalline quality of the sample.

4. Nanoindeter Micro Materials NanoTest 600

It measures the hardness, elastic modulus and deformation characteristics of solids. The device has two indentation mechanisms for different loads: the nanopendulum allows us to apply a load from 0.3 nN to 500 mN by the Berkovich diamond pyramid and fix the depth of its penetration into the sample from 0.001 nm to 50 μm; the micropendulum can generate a load up to 30 N.

5. Ellipsometer J.A. Woollam M-2000RCE

6. Atomic force and scanning tunneling microscopes  Nanosurf EasyScan 2 AFM & STM

7. System for measurement of curvature of wafers and stress in thin films Toho FLX-2320-S

8. Optical profilometer Zygo NewView 6000

9. Installation for measurement of electron-optical properties of crystals and thin films

10. Industrial furnace Nabertherm for wafers of big diameter

11. Experimental reactor for growing silicon carbide on silicon by the method of coordinated substitution of atoms

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