Aluminum nitride on silicon: Role of silicon carbide interlayer and chloride vapor-phase epitaxy tec
Year(s):
2010
Autors:
Bessolov V.N. , Zhilyaev Y.V. , Konenkova E.V. , Sorokin L.M. , Feoktistov N.A. , c.o.p.a.m.s. Sharofidinov Sh.Sh. , Shcheglov M.P. , d.o.p.a.m.s. Kukushkin S.A. , Mets L.I. , d.o.p.a.m.s. Osipov A.V. ,
Name Publication:
Technical Physics Letters
Volume Publication:
36
Issue Publication:
6
Pages:
496 - 499