Pendeo-epitaxy of stress-free AlN layer on a profiled SiC/Si substrate
Year(s):
2016
Autors:
c.o.p.a.m.s. Redkov A.V. , d.o.p.a.m.s. Kukushkin S.A. , d.o.p.a.m.s. Nikolai Bessonov , d.o.p.a.m.s. Osipov A.V. , D.V. Karpov, E.V. Konenkova, A.А. Lipovskii, I.P. Soshnikov
Quarter:
Q1
Name Publication:
Thin Solid Films
Issue Publication:
606
Pages:
74-79